Repetitive pulses of voltage and current are applied in high power impulse magnetron sputtering. The current pulse usually lags the applied voltage by a significant time, which in some cases can reach many 10s of microseconds. The current time lag is generally highly reproducible and jitters less than 1percent of the delay time. This work investigates the time lag experimentally and theoretically. The experiments include several different target and gas combinations, voltage and current amplitudes, gas pressures, pulse repetition rates, and pulse durations. It is shown that in all cases the inverse delay is approximately proportional to the applied voltage, where the proportionality factor depends on the combination of materials and the conditions selected. The proportionality factor contains the parameters of ionization and secondary electron emission. The statistical time lag is negligible while the formative time lag is large and usually dominated by the ion motion (inertia), although, at low pressure, the long free path of magnetized electrons causing ionization contributes to the delay.

Thallium arc plasma was investigated in a vacuum arc ion source. As expected from previous consideration of cathode materials in the Periodic Table of the Elements, thallium plasma shows lead-like behavior. Its mean ion charge state exceeds 2.0 immediately after arc triggering, reaches the predicted 1.60 and 1.45 after about 100 microsec and 150 microsec, respectively. The most likely ion velocity is initially 8000 m/s and decays to 6500 m/s and 6200 m/s after 100 microsec and 150 microsec, respectively. Both ion charge states and ion velocities decay further towards steady state values, which are not reached within the 300 microsec pulses used here. It is argued that the exceptionally high vapor pressure and charge exchange reactions are associated with the establishment of steady state ion values.

A new version of a Constricted Plasma Source is described, characterized by all metal-ceramic construction, a linear slit exit of 180 mm length, and cw-operation (typically 50 kHz) at an average power of 1.5 kW. The plasma source is here operated with oxygen gas, producing streaming plasma that contains mainly positive molecular and atomic ions, and to a much lesser degree, negative ions. The maximum total ion current obtained was about 0.5 A. The fraction of atomic ions reached more than 10 percent of all ions when the flow rate was less then 10 sccm O2, corresponding to a chamber pressure of about 0.5 Pa for the selected pumping speed. The energy distribution functions of the different ion species were measured with a combined mass spectrometer and energy analyzer. The time-averaged distribution functions were broad and ranged from about 30eV to 90 eV at 200 kHz and higher frequencies, while they were only several eV broad at 50 kHz and lower frequencies, with the maximum located at about 40 eV for the grounded anode case. This maximum was shifted down to about 7 eV when the anode was floating, indicating the important role of the plasma potential for the ion energy for a given substrate potential. The source could be scaled to greater length and may be useful for functionalization of surfaces and plasma-assisted deposition of compound films.

Time-dependent ion charge state measurements for Pb and Bi cathodic arc plasmas revealed unexpectedly strong differences: the mean Bi ion charge state dropped much stronger and with a longer time constant than the mean Pb ion charge state. It is shown that the difference in thermal conductivity led to much higher vapor pressure for Bi, which in turn much more effectively caused charge exchange collisions. The results have implications beyond Pb and Bi plasmas, most importantly that the "true" charge states as emitted from the cathode spot are higher than what is generally measured and published.

Ion charge state distributions of cathodic vacuum arcs have been investigated using a modified time-of-flight method. Experiments have been done in double gate and burst gate mode, allowing us to study both systematic and stochastic changes of ion charge state distributions with a time resolution down to 100 ns. In the double gate method, two ion charge spectra are recorded with a well-defined time between measurements. The elements Mg, Bi, and Cu were selected for tests, representing metals of very different properties. For all elements it was found that large stochastic changes occur even at the limit of resolution. This is in agreement with fast changing arc properties observed elsewhere. Correlation of results for short times between measurements was found but it is argued that this is due to velocity mixing rather than due to cathode processes. The burst mode of time-of-flight measurements revealed the systematic time evolution of ion charge states within a single arc discharge, as opposed to previous measurements that relied on data averaged over many pulses. The technique shows the decay of the mean ion charge state as well as the level of material-dependent fluctuations.

Cathodic arc plasmas are considered fully ionized and they contain multiply charged ions, yet, gaseous and metal neutrals can be present. It is shown that they can cause a significant reduction of the ion charge states as measured far from the cathode spots. Several cathode materials were used to study the evolution the mean ion charge state as a function of time after arc ignition. The type of cathode material, arc current amplitude, intentionally increased background gas, additional surfaces placed near the plasma flow, and other factors influence the degree of charge state reduction because all of these factors influence the density of neutrals. In all cases, it was found that the mean ion charge state follows an exponential decay of first order, Q(t) = A * exp(t/tau) + Qss, where A is a parameter describing the importance of the decay, tau is the characteristic decay time, and Qss is a steady-state value approached for continuous arc operation. The extrapolated values Q(t-->0) indicate surprisingly high mean charge states as produced at cathode spots and not "skewed" by charge exchange collisions with neutrals.

Vacuum arc ion sources, commonly also known as "Mevva" ion sources, are used to generate intense pulsed metal ion beams. It is known that the mean charge state of the ion beam lies between 1 and 4, depending on cathode material, arc current, arc pulse duration, presence or absence of magnetic field at the cathode, as well background gas pressure. A characteristic of the vacuum arc ion beam is a significant decrease in ion charge state throughout the pulse. This decrease can be observed up to a few milliseconds, until a "noisy" steady-state value is established. Since the extraction voltage is constant, a decrease in the ion charge state has a proportional impact on the average ion beam energy. This paper presents results of detailed investigations of the influence of arc parameters on the temporal development of the ion beam mean charge state for a wide range of cathode materials. It is shown that for fixed pulse duration, the charge state decrease can be reduced by lower arc current, higher pulse repetition rate, and reduction of the distance between cathode and extraction region. The latter effect may be associated with charge exchange processes in the discharge plasma.

A vacuum arc ion source was modified allowing us to collect ions from arc plasma streaming through an anode mesh. The mesh had a geometric transmittance of 60 percent, which was taken into account as a correction factor. The ion current from twenty-two cathode materials was measured at an arc current of 100 A. The ion current normalized by the arc current was found to depend on the cathode material, with valuesin the range from 5 percent to 11 percent. The normalized ion current is generally greater for light elements than for heavy elements. The ion erosion rates were determined from values of ion currentand ion charge states, which were previously measured in the same experimental system. The ion erosion rates range from 12-94 mu g/C.