Aromatic polyamide films form the active layer in reverse osmosis desalination membranes. Despite widespread use of this technology, it suffers from low rejection rates for certain water contaminants and from membrane fouling. Through a better understanding of the fundamental surface chemical processes during reverse osmosis desalination, advances in membrane and material design are expected. The recent invention of a molecular layer-by-layer (mLbL) preparation technique [ Johnson , P. M. ; Molecular Layer-by-Layer Deposition of Highly Crosslinked Polyamide Films . J. Polym. Sci., Part B: Polym. Phys. 2012 , 50 ( 3 ), 168 - 173 ] yields films that are sufficiently smooth to warrant investigation with high-resolution microscopy and spectroscopy methods. We present high-resolution, quantitative X-ray photoelectron spectroscopy (XPS) data on the surface chemistry of ultrathin polyamide films that can serve as a model system for desalination membranes. We show that a quantitative analysis of the XPS spectra gives information about the functional groups of the film as well as other compounds present due to the synthesis under ambient conditions. Unpolymerized functional groups are identified and aid in understanding the degree of cross-linking. Investigation of polymers with synchrotron-based XPS requires taking beam-induced changes into account. We quantify X-ray beam damage and show that beam damage to the polyamide is limited, allowing long-term investigation of thin polyamide films. Characterizing mLbL-grown films via high-resolution XPS is the basis for a better understanding of the chemical interplay of polyamide surface functional groups with the major components of desalination systems.

Dimethyl methylphosphonate (DMMP) is a common chemical warfare agent simulant and is widely used in adsorption studies. To further increase the understanding of DMMP interactions with metal oxides, ambient pressure X-ray photoelectron spectroscopy was used to study the adsorption of DMMP on MoO3, including the effects of oxygen vacancies, surface hydroxyl groups, and adsorbed molecular water. Density functional theory calculations were used to aid in the interpretation of the APXPS results. An inherent lack of Lewis acid metal sites results in weak interactions of DMMP with MoO3. Adsorption is enhanced by the presence of oxygen vacancies, hydroxyl groups, and molecular water on the MoO3 surface, as measured by photoelectron spectroscopy. Computational results agree with these findings and suggest the formation of methanol through several possible pathways, but all require a proton transferred from a hydroxyl group on the surface.

We use ambient-pressure X-ray photoelectron spectroscopy (APXPS) to study chemical changes, including hydroxylation and water adsorption, at copper oxide surfaces from ultrahigh vacuum to ambient relative humidities of ∼5%. Polycrystalline CuO and Cu₂O surfaces were prepared by selective oxidation of metallic copper foils. For both oxides, hydroxylation occurs readily, even at high-vacuum conditions. Hydroxylation on both oxides plateaus near ∼0.01% relative humidity (RH) at a coverage of ∼1 monolayer. In contrast to previous studies, neither oxide shows significant accumulation of molecular water; rather, both surfaces show a high affinity for adventitious carbon contaminants. Results of isobaric and isothermic experiments are compared, and the strengths and potential drawbacks of each method are discussed. We also provide critical evaluations of the effects of the hot filament of the ion pressure gauge on the reactivity of gas-phase species, the peak fitting procedure on the quantitative analysis of spectra, and rigorous accounting of carbon contamination on data analysis and interpretation. This work underscores the importance of considering experimental design and data analysis protocols during APXPS experiments with water vapor in order to minimize misinterpretations arising from these factors.