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Scholarly Works (4 results)
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Article
Determining the Critcial Size of EUV Mask Substrate Defects
Han, Hakseung
Lawrence Berkeley National Laboratory
(2008)
Article
Determining the critical size of EUV mask substrate defects
Han, Hakseung
Lawrence Berkeley National Laboratory
(2008)
Article
Extendibility using EUV actinic inspection tool for sub-32-nm node
Huh, Sungmin
;
Wurm, Stefan
;
Han, Hakseung
;
Goldberg, Kenneth
;
Mochi, Iacopo
LBL Publications
(2008)
Article
EUV and non-EUV inspection of reticle defect repair sites
Goldberg, Kenneth A.
;
Barty, Anton
;
Seidel, Phillip
;
Fettig, Rainer
;
Kearney, Patrick
;
Han, Hakseung
;
Wood, Obert R.
LBL Publications
(2006)
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