We have investigated the adsorption and subsequent desorption of Ga on (0001) GaN using simultaneous line-of-sight quadrupole mass spectrometry (QMS) and reflection high-energy electron diffraction (RHEED). The in situ QMS and RHEED desorption transient measurements demonstrate the Ga flux dependent accumulation of the theoretically predicted laterally contracted Ga bilayer [J. E. Northrup , Phys. Rev. B 61, 9932 (2000)] under conditions similar to those used during GaN growth by rf-plasma molecular beam epitaxy. We correlated bioscillatory RHEED desorption transients [C. Adelmann , J. Appl. Phys. 91, 9638 (2002)] to QMS-measured Ga-adsorbate coverage and found both to be consistent with layer-by-layer desorption of the Ga-adsorbate bilayer. The QMS-measured steady-state Ga-adlayer coverage exhibited a continuous increase from 0 to 2.4 ML (monolayer) with respect to impinging Ga flux at substrate temperatures of 640-700 degrees C. We observed an exponential dependence of the Ga flux corresponding to 1.0 ML Ga-adsorbate coverage on substrate temperature and we measured an apparent activation energy of 2.43 +/- 0.11 eV and an attempt prefactor of 6.77x10(12) nm/min (4.36x10(11) Hz) for this transition. (c) 2006 American Institute of Physics.

The authors have investigated the adsorption and subsequent desorption of Ga on AlN (0001) with line-of-sight quadrupole mass spectrometry (QMS). The authors present desorption data consistent with a continuous Ga-flux dependent accumulation of a laterally contracted Ga bilayer on AlN (0001) from 0 to 2.7 +/- 0.3 ML GaN equivalent coverage, and further Ga accumulation in macroscopic Ga droplets. The temperature dependence of Ga-adsorbate QMS desorption transients was investigated and the authors determined that the desorption activation energies for individual monolayers of the Ga adsorbate on AlN (0001) were similar to Ga desorption from GaN (0001). For the (first) pseudomorphic Ga-adsorbate monolayer on AlN, the authors measured a maximum Ga coverage of 1.0 +/- 0.1 ML and desorption activation energy of 6.2 +/- 0.3 eV. For the (second) laterally contracted Ga monolayer (1.7 +/- 0.3 ML) the desorption activation energy was 3.8 +/- 0.1 eV. (c) 2006 American Vacuum Society.

We have investigated the Ga-adlayer mediated growth of GaN quantum dots at 707 degrees C on AlN (0001) by simultaneous use of in situ reflection high-energy electron diffraction and line-of-sight quadrupole mass spectrometry during rf-plasma assisted molecular beam epitaxy (PA-MBE). We have found that the Ga-adsorbate coverage of 1.0 ML (monolayer) is critical in the mediation of a fundamental change in the GaN Stranski-Krastanov (SK) growth mode on AlN. When the Ga-adsorbate coverage was less than 1.0 ML, the SK transition occurred during GaN growth. For larger Ga-adsorbate coverages, the SK transition occurred after the desorption of the Ga coverage in excess of 1.0 ML. We performed variable GaN coverage growth experiments followed by desorption of the Ga adsorbate and subsequent GaN thermal decomposition to determine that the critical GaN coverage for the SK transition was less than 2.0 ML under Ga-droplet PA-MBE growth conditions.